Chemical Name |
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C2
H8O
7P2
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Technical Specification |
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- |
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- |
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- |
Characteristics:
with Fe, Cu, and Zn ions to form stable chelating compounds.
temperature 250ºC. HEDP has good chemical stability under high
oxidation tolerance are better than that of other organophosphoric
Therefore, HEDP has good antiscale and visible threshold effects.
• used as cleaning agent in electronic fields and as additives in daily