Description
CMP(Chemical Mechanical Polishing)filter cartridges is constructed of polypropylene filter media to ensure high efficiency by layering filter media inside of the filter. CMP filter is used for the filtration of both oxide and metal slurry at chemical mechanical polishing process.
This multi-layer depth structure provides high dirt holding capacity.
Available in a wide absolute filter removal ratings from 0.5㎛ to 40㎛
Application
Oxide slurry, Metal slurry, Chemical slurry, Pigment.
Specification
Material of Construction
Media : Polypropylene microfiber 100% Core/cage : Polypropylene Sealing : Thermal bonding
Recommended Operating Conditions
Maximum Differential Pressure : 70psi(4.8bar) at 25
Removal Ratings(㎛)
0.5, 0.3, 0.5, 0.7, 1, 10, 20, 40
Cartridge Dimensions
In diameter : 30mm Out diameter : 65mm
Removal Efficiency
Absolute grade(99.98%)
Ordering Information
| Special Option | ||||||
| lxtus |
|
01:1.0㎛ 03:3.0㎛ 05:5.0㎛ 07 : 0.7㎛ 10:10.0㎛ 20:20.0㎛ 40:40.0㎛ |
'B':254mm D/O 'C':2-222 O-ring / Flat ent 'D':2-226 O-ring / Flat end 'E':2-222 O-ring / Fin end 'F':2-226 O-ring / Fin end |
'1':10" '2':20" '3':30" '4':40" |
N:Buna-N S:Silicone V:Viton T:Teflon encapsulated Viton | V : Vacuum Packaging S : SUS ring Insertion |
