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Pioneer 300 for Wafer
Pioneer 300 for Wafer
FOB Price
Korea (North)
Main Products : Machinery
#946, Industrial Area Kosekdong Kwonsungu, Suwon City, Gyeonggi-do
Pioneer 300 for Wafer Introduce

Features

Digital Analyzer for Wafer Surface!!

The Pioneer 300 Wafer Surface Analysis System is specially designed for use in 300 mm semiconductor wafer processing for quality control.

The Pioneer 300 provides quick and accurate contact angle/surface energy measurements of the wafer surface for adhesion, cleanliness and surface treatments.

The use of anti-static materials in the Pioneer 300 makes it well suited for semiconductor applications, and the system can be used to monitor the ultra clean surface processing of silicon wafers.

The position of the sample stage is computer controlled and can be precisely adjusted along the x-, y-, or z- axis.

The user can easily control the position of the stage to allow for wafer surface mapping.

The instrument uses micro-pump controlled by PC for precise and repeatable liquid drop formation and application.

This insures that a reproducible drop volume is applied to the surface..

Typical Applications Coating assessment of the HMDS process.

Wafer mapping Display for surface contamination detection.

Adhesive and primer preparation.

Coating uniformity & Coating quality.

Product specification/models

Model
SEO Pioneer 300M (Manual type)
SEO Pioneer 300A (Automatic type)
Power
220V, 50/60Hz
Max. Sample size
300 mm Wafer (4/6/8/12 inches wafer available)
Max. Sample thickness
10 (mm)
Zoom
6.4 fold
Focus
Internal, ±6 (mm)
Resolution
768 x 576 NTSC, 16M color
Max. Measuring speed
20 images/s
Contact angle
0 -180°C, +/-0.1°C
Moving type
Automatic (X-, Y-, Z- and Rotating)
Dispenser type
Automatic syringe system
Light source
Rear lamp, Halogen
Operating system
Window 98/ Me/ XP
Evaluation methods
Static contact angle/ Surface Energy
Accessories
Instruction/Operation Manual, Tip set, Level, TweezersFuse, Lamp, Teflon Tube, Tool box, etc

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