Features
Digital Analyzer for Wafer Surface!!
The Pioneer 300 Wafer Surface Analysis System is specially designed for use in 300 mm semiconductor wafer processing for quality control.
The Pioneer 300 provides quick and accurate contact angle/surface energy measurements of the wafer surface for adhesion, cleanliness and surface treatments.
The use of anti-static materials in the Pioneer 300 makes it well suited for semiconductor applications, and the system can be used to monitor the ultra clean surface processing of silicon wafers.
The position of the sample stage is computer controlled and can be precisely adjusted along the x-, y-, or z- axis.
The user can easily control the position of the stage to allow for wafer surface mapping.
The instrument uses micro-pump controlled by PC for precise and repeatable liquid drop formation and application.
This insures that a reproducible drop volume is applied to the surface..
Typical Applications Coating assessment of the HMDS process.
Wafer mapping Display for surface contamination detection.
Adhesive and primer preparation.
Coating uniformity & Coating quality.
Product specification/models
Model
|
SEO Pioneer 300M (Manual type)
SEO Pioneer 300A (Automatic type) |
Power
|
220V, 50/60Hz
|
Max. Sample size
|
300 mm Wafer (4/6/8/12 inches wafer available)
|
Max. Sample thickness
|
10 (mm)
|
Zoom
|
6.4 fold
|
Focus
|
Internal, ±6 (mm)
|
Resolution
|
768 x 576 NTSC, 16M color
|
Max. Measuring speed
|
20 images/s
|
Contact angle
|
0 -180°C, +/-0.1°C
|
Moving type
|
Automatic (X-, Y-, Z- and Rotating)
|
Dispenser type
|
Automatic syringe system
|
Light source
|
Rear lamp, Halogen
|
Operating system
|
Window 98/ Me/ XP
|
Evaluation methods
|
Static contact angle/ Surface Energy
|
Accessories
|
Instruction/Operation Manual, Tip set, Level, TweezersFuse,
Lamp, Teflon Tube, Tool box, etc
|