High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.
Manufacturing processes depend on the properties of the target material and its application.
Both Planar and Rotary target available
Planar targets mainly refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods to meet different needs.
Reference size
Width: max 2000mm
* Maximum sizes of rotary target
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Width: max 2000mm
Vacuum/Air Spraying
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Bonding
Metal sputtering targets , you can contact our sales team directly or fill out the form below and we will get back to you in time.
