High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target.
Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target.
Width: max 2000mm
* Maximum sizes of rotary target
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
sputtering target , you can contact our sales team directly or fill out the form below and we will get back to you in time.