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Sputtering Target:SIO2 Target
Sputtering Target:SIO2 Target
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Shanghai Taikang Nanochemistry Technology Limited
China
Main Products : Hydroxyapatite, SiO2, Foam Metal, Evaporation Materials, Sputtering Target, Zeolites, Graphene
Pudong new area,Shanghai 200120 China Shanghai Shanghai China Shanghai, Shanghai
Sputtering Target:SIO2 Target Details
Place of Origin
China
Sputtering Target:SIO2 Target Introduce

Silicon Dioxide (SiO2) Target

Purity

(%)

Density

(g/cm3)

Shape & Size

99.9

2.21

Circular

Φ18~30x7~18mm

Ring

Φ230~350x5~20mm

Plate

Previous : Bismuth Oxide Next : Evaporation Materials
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