Feature/Function:

* Integrated design, less occupied area, competitive price, stable performance and low maintenance costs;

* Equipped with 4~6 groups of evaporation sources, compatible with organic evaporation and inorganic evaporation, multi-source co-evaporation obtain composite film/partial evaporation obtain multi-layer film, powerful and stable performance;

* Suitable for laboratory preparation of metal mono film, semiconductor film, organic film, also can be used for pre-production process test, etc.;

Application: It is widely used in the research and small batch preparation of new film materials for colleges & universities, research institutes and enterprises.

Technical Parameters:

Equipment Name: Thermal Evaporator

Model: ZHD400

Coating Method: Multi-source evaporation coating

Chamber Structure: Box-type front door structure

Chamber Size: L400×W440×H450mm

Baking Temperature: Room temperature to 300℃

Rotating Substrate Holder: 120mm×120mm

Substrate Holder Lift: Manually adjust the lifting height between 0-80mm

Film Thickness Nonuniformity: ≤±5.0%

Evaporation Source: 2~3 Groups of metal sources, 2~3 Groups of organic sources

Control Method: PLC control

Occupied Area: (Mainframe) L1750×W850×H1910mm

Power: ≥8kW